Hsinchu, Taiwan

Chen-Ming Chiu

This inventor holds 1 USPTO granted patent. Top assignee: Fitipower Integrated Technology, Inc.. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chen-Ming Chiu. Retrieved from https://idiyas.com/inventor/chen-ming-chiu-wvhadr3e

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovations of Chen-Ming Chiu

Introduction: Chen-Ming Chiu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His work has led to advancements that are crucial for modern electronic devices.

Latest Patents: Chen-Ming Chiu holds a patent for a lateral diffused metal oxide semiconductor device. This innovative device includes a first-type substrate, a gate oxide film, and a poly gate. It also features a first second-type slightly doped region acting as a well, along with various highly doped regions that function as the body, source, and drain. This patent showcases his expertise in semiconductor design and engineering.

Career Highlights: Chiu is currently employed at Fitipower Integrated Technology, Inc., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing efficient and reliable semiconductor devices that are widely used in the industry.

Collaborations: Throughout his career, Chen-Ming Chiu has collaborated with esteemed colleagues such as Chyh-Yih Chang and Hsing-Hua Sun. These partnerships have fostered innovation and have contributed to the success of various projects within the semiconductor field.

Conclusion: Chen-Ming Chiu's contributions to semiconductor technology through his patent and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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