Chen-Mei Fan

Title: Chen-Mei Fan: Innovator in Semiconductor Technology

Introduction

Chen-Mei Fan is a notable inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative structures and methods that enhance the performance and reliability of integrated circuits.

Latest Patents

Chen-Mei Fan's latest patents include a semiconductor structure and a manufacturing method thereof. This semiconductor structure comprises a substrate, a dam element, a first isolation layer, a second isolation layer, and a conductive layer. The substrate features a conductive pad, a trench, a sidewall, a first surface, and a second surface opposite to the first surface. The conductive pad is located on the second surface, while the trench has a first opening at the first surface and a second opening at the second surface. The dam element, positioned on the second surface, covers the second opening and includes a concave portion at that opening. The first isolation layer is situated on a portion of the sidewall, and the second isolation layer is located on the first surface and the sidewall not covered by the first isolation layer, forming an interface between the two layers.

Another significant patent is for an integrated circuit package and the method for its fabrication. This invention provides an integrated circuit package that includes an integrated circuit chip with a photosensitive device. A bonding pad is formed on the upper surface of the chip and is electrically connected to the photosensitive device. A barrier is formed between the bonding pad and the photosensitive device, while a conductive layer is created on the sidewall of the integrated circuit chip, also connected to the bonding pad. The barrier layer effectively blocks overflow of the adhesive layer into the region where the photosensitive device is located, thereby improving the yield in fabricating the integrated circuit package.

Career Highlights

Throughout his career, Chen-Mei Fan has worked with various companies, including Xintec Corporation. His expertise in semiconductor technology has allowed him to contribute to advancements in the field, making him a respected figure among his peers.

Collaborations

Chen-Mei Fan has collaborated with notable coworkers, including Yu-Lin Yen and Hung-Chang Chen. These collaborations have further enriched his work and contributed to the development of innovative technologies.

Conclusion

In summary, Chen-Mei Fan is a distinguished inventor