Hsinchu, Taiwan

Chen-Hsueh Lin

This inventor holds 1 USPTO granted patent and 10 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chen-Hsueh Lin. Retrieved from https://idiyas.com/inventor/chen-hsueh-lin-9ieas99h

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Chen-Hsueh Lin

Introduction

Chen-Hsueh Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His work primarily focuses on improving processes related to wafer surface cleaning.

Latest Patents

Chen-Hsueh Lin holds a patent titled "System and Method for Cleaning a Wafer Surface." This innovation addresses critical challenges in maintaining the cleanliness of wafer surfaces, which is essential for the production of high-quality semiconductor devices. He has 1 patent to his name.

Career Highlights

Lin is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His role involves developing advanced technologies that enhance manufacturing processes. His expertise has contributed to the company's reputation for innovation and quality.

Collaborations

Throughout his career, Chen-Hsueh Lin has collaborated with talented individuals such as Hui-Chi Huang and Kei-Wei Chen. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Chen-Hsueh Lin's contributions to semiconductor technology exemplify the impact of innovation in the industry. His patent for cleaning wafer surfaces showcases his commitment to advancing manufacturing processes. His work continues to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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