Chen-Hsuan Lu

Title: Innovations of Chen-Hsuan Lu in Graphene Technology

Introduction

Chen-Hsuan Lu is an accomplished inventor based in Pasadena, CA. He has made significant contributions to the field of materials science, particularly in the development of methods for graphene formation. His innovative approach has the potential to revolutionize flexible electronics and other applications.

Latest Patents

Chen-Hsuan Lu holds a patent for "Methods and devices for graphene formation on flexible substrates by plasma-enhanced chemical vapor deposition." This patent describes a method of forming graphene on a flexible substrate, which includes providing a polymer substrate with a metal structure, a carbon source, and a carrier gas. The process involves subjecting the polymer substrate to a plasma-enhanced chemical vapor deposition (PECVD) process, resulting in the growth of a graphene layer on the copper structure.

Career Highlights

Throughout his career, Chen-Hsuan Lu has worked with prestigious institutions such as the California Institute of Technology and the Industrial Technology Research Institute. His work has been instrumental in advancing the understanding and application of graphene in various fields.

Collaborations

Some of his notable coworkers include Chyi-Ming Leu and Nai-Chang Yeh, who have collaborated with him on various projects related to graphene technology.

Conclusion

Chen-Hsuan Lu's innovative work in graphene formation showcases his expertise and dedication to advancing materials science. His contributions are paving the way for future developments in flexible electronics and beyond.