The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2023

Filed:

Oct. 13, 2021
Applicants:

California Institute of Technology, Pasadena, CA (US);

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Chen-Hsuan Lu, Pasadena, CA (US);

Chyi-Ming Leu, Hsinchu, TW;

Nai-Chang Yeh, Pasadena, CA (US);

Chih-Cheng Lin, Hsinchu, TW;

Chi-Fu Tseng, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/02 (2006.01); H01L 21/02 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); C30B 25/02 (2013.01); H01L 21/02425 (2013.01); H01L 21/02527 (2013.01); H01L 29/1606 (2013.01);
Abstract

A method of forming graphene on a flexible substrate includes providing a polymer substrate including a metal structure and providing a carbon source and a carrier gas. The method also includes subjecting the polymer substrate to a plasma enhanced chemical vapor deposition (PECVD) process and growing a graphene layer on the copper structure.


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