This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Che-li Lin and Semiconductor Wet-Cleaning Technology.
Introduction
Che-li Lin is an inventor associated with Kaohsiung, Taiwan. His patent work addresses semiconductor wet-cleaning equipment and methods, with a focus on controlling how gases and fluids are delivered during cleaning.
Latest Patents
Lin is credited with 1 patent: “Wet Cleaning Tool and Method.” The invention describes a semiconductor cleaning tool with a nozzle connected to separate inlets for a carrier gas and one or more fluids. Inside the nozzle, gas and fluid passageways divide into branches arranged in an interweaving pattern. The individual branches can be controlled separately, allowing adjustments to flow rate, temperature, on/off state, gas or fluid type, timing, and supply mode. This design supports flexible control of the spray used in semiconductor cleaning.
Career Highlights
Lin is associated with Taiwan Semiconductor Manufacturing Company Limited. His patent reflects work on precision fluid and gas delivery for semiconductor manufacturing processes.
Collaborations
Lin’s listed coworker is Chen-chieh Chiang. Their shared association with semiconductor technology connects their work to the development of manufacturing tools and processes.
Conclusion
Che-li Lin’s patent presents a configurable approach to semiconductor wet cleaning by enabling independent control of interwoven gas and fluid branches in a nozzle.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile