This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Che-Hsin Lin: Semiconductor Lithography Inventor
Introduction
Che-Hsin Lin is an inventor based in Hsinchu, Taiwan. His patent work concerns semiconductor lithography and monitoring tin supply in a system that generates light for patterning.
Latest Patents
Lin is associated with 1 patent: “Lithography System with Non-Invasive Monitoring and Methods.” The disclosed method forms a mask layer on a semiconductor wafer and supplies tin from a low-pressure reservoir to a high-pressure reservoir. At least two electrodes monitor the tin level in the high-pressure reservoir. When the level exceeds a threshold, tin is supplied to a droplet generator, which forms a tin droplet. The droplet generates light that patterns the mask layer.
Career Highlights
Lin is associated with Taiwan Semiconductor Manufacturing Co., Ltd. His patent describes a monitoring approach for managing tin levels as part of a lithography process.
Collaborations
The provided information lists Chi Yang and Po-Yuan Yeh as Lin’s coworkers.
Conclusion
Che-Hsin Lin’s patent focuses on non-invasive tin-level monitoring and droplet generation for light-based semiconductor lithography.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile