Che Chen Hsu

Title: Che Chen Hsu: Innovator in Patterned Structures

Introduction

Che Chen Hsu is a notable inventor based in Tama, Japan. He has made significant contributions to the field of materials science, particularly in the development of methods for mitigating underlayer damage during the formation of patterned structures. His innovative approach has implications for various applications in semiconductor manufacturing.

Latest Patents

Hsu holds a patent titled "Method and system for mitigating underlayer damage during formation of patterned structures." This patent describes methods of forming structures suitable for a multiple patterning process. The exemplary methods include forming a material overlying the substrate by providing a silicon precursor to the reaction chamber for a silicon precursor pulse period. Additionally, it involves providing one or more of a nitrogen reactant and an oxygen reactant to the reaction chamber for a reactant pulse period. The process also includes providing an inert gas to the reaction chamber for an inert gas pulse period and applying plasma power to form a plasma within the reaction chamber for a plasma pulse period. The inert gas can be provided during the plasma period, and the plasma power can be pulsed to mitigate any damage to an underlying layer while providing desired properties of the material layer. Hsu's innovative work is encapsulated in his 1 patent.

Career Highlights

Che Chen Hsu is currently associated with ASML IP Holding B.V., where he continues to push the boundaries of technology in his field. His work is instrumental in advancing the techniques used in semiconductor fabrication, which is crucial for the development of modern electronic devices.

Collaborations

Hsu has collaborated with esteemed colleagues such as Eiichiro Shiba and Tomomi Takayama. These collaborations have fostered an environment of innovation and have contributed to the success of their projects.

Conclusion

Che Chen Hsu is a prominent figure in the realm of patterned structures, with a focus on mitigating underlayer damage in semiconductor processes. His contributions through his patent and collaborations highlight his role as an innovator in the industry.