Company Filing History:
Years Active: 2000
Title: The Innovative Contributions of Charlotte R. DeWan in Photo Acid Generator Technology
Introduction
Charlotte R. DeWan, a talented inventor residing in Beacon, NY, has made significant strides in the realm of chemical engineering and photolithography. With an impressive patent portfolio that includes a breakthrough in photo acid generator compounds, DeWan has influenced the development of photoresists and methods for enhancing photolithography processes.
Latest Patents
DeWan's notable patent revolves around "Photo acid generator compounds, photo resists, and method for improving." This innovation introduces several mid UV photo acid generators (PAGs), a chemically amplified photo resist (CAMP), and a method aimed at improving the nested to isolated line bias. One of the standout features of this invention is that it does not require a mid UV sensitizer, which is a departure from traditional PAGs. Instead, the PAG compounds developed by DeWan include chromophores that can absorb mid UV radiation effectively, making them suitable for use in chemically amplified photo resists with a photo speed metric of 500 mJ/cm² or less, preferably aiming for 200 mJ/cm² or less.
Career Highlights
Charlotte R. DeWan is associated with the renowned International Business Machines Corporation (commonly known as IBM). Throughout her career, she has focused on addressing the challenges faced in the photolithography field by developing more efficient and effective compounds that enhance photo speeds without compromising performance.
Collaborations
DeWan's innovative journey is marked by collaboration with notable colleagues including Gregory Breyta and Phillip Joe Brock. Their collective efforts have led to the advancement of technologies that are crucial for the semiconductor industry, where precision and efficiency are paramount.
Conclusion
Charlotte R. DeWan exemplifies the spirit of innovation through her contributions to photo acid generator technology. With her groundbreaking patent, she has influenced key developments within the photolithography space, particularly in enhancing the performance of photoresists. As her career progresses, the impact of her work at IBM will likely continue to shape the future of semiconductor manufacturing and chemical engineering.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.