This inventor holds 1 USPTO granted patent. Top assignee: Fsi International, Inc.. Active years: 1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1992
Title: Charles W. Skinner and Wafer-Processing Innovation.
Introduction
Charles W. Skinner is an inventor associated with Lubbock, Texas, and FSI International, Inc. His patent work addresses wafer-processing equipment and the rinsing of wafers during processing.
Latest Patents
Skinner is credited with 1 patent: “Apparatus for Wafer Processing with In Situ Rinse.” The invention describes an apparatus with a head that defines an etching chamber. Its sidewall can slide along the base and lift to open a passage for rinsing water. A deflecting surface directs the water downward for drainage, while the housing can be separated above the deflector ring to provide access for inserting or replacing a wafer.
Career Highlights
Skinner’s patent reflects a practical approach to wafer-processing equipment, combining an etching chamber with an in situ rinse mechanism and access for wafer handling. The available information associates his work with FSI International, Inc.
Collaborations
His listed coworkers include Rex L. Biggerstaff and Daniel J. Syverson.
Conclusion
Charles W. Skinner’s patented apparatus brings together wafer etching, rinsing, drainage, and wafer access in a single processing design.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile