Company Filing History:
Years Active: 1995-2002
Title: The Innovative Contributions of Charles S. Dulcey
Introduction
Charles S. Dulcey is a notable inventor based in Washington, DC, with a remarkable portfolio of 6 patents. His work primarily focuses on methods and materials for modifying polymer films, showcasing his expertise in the field of materials science and engineering.
Latest Patents
Dulcey's latest patents include innovative processes for selectively modifying photopatterned polymer films. One significant aspect of his invention involves a method for modifying a substrate in areas exposed to actinic radiation. This process includes several steps: providing functional groups on the substrate that convert to oxygen-containing photoproducts upon exposure, exposing the substrate to actinic radiation, and subsequently contacting the photoproducts with amines to form imine groups. Another aspect of his invention addresses the modification of unexposed areas of the substrate, allowing for selective physisorption of compounds. Additionally, he has developed methods for surface modification that create regions resistant to biomolecule adsorption through ultraviolet light irradiation.
Career Highlights
Throughout his career, Dulcey has worked with prominent organizations, including the United States Navy and Shipley Company, LLC. His contributions to these institutions have significantly advanced the understanding and application of polymer modification techniques.
Collaborations
Dulcey has collaborated with esteemed colleagues such as Jeffrey M. Calvert and Walter J. Dressick, further enhancing the impact of his innovative work in the field.
Conclusion
Charles S. Dulcey stands out as a significant figure in the realm of innovation, with his patents reflecting a deep understanding of polymer science and its applications. His contributions continue to influence advancements in material modification techniques.
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