Somers, NY, United States of America

Charles R Guarnieri


Average Co-Inventor Count = 3.8

ph-index = 7

Forward Citations = 758(Granted Patents)


Location History:

  • San Jose, CA (US) (1979)
  • Somers, NY (US) (1987 - 1994)

Company Filing History:


Years Active: 1979-1994

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7 patents (USPTO):

Title: The Innovative Journey of Charles R Guarnieri

Introduction:

Charles R Guarnieri, a prolific inventor based in Somers, NY (US), has made significant contributions to the field of contamination control in processing apparatus. With a total of 7 patents to his name, Guarnieri's expertise in plasma chamber technology has revolutionized the way in which particulate contamination is managed within process chambers.

Latest Patents:

His latest patents showcase his inventive prowess, particularly in the development of methods and apparatus for contamination control in processing apparatus. His designs incorporate voltage-driven electrodes and unique surface features on workpieces to create electrostatic potential patterns that effectively trap and remove particulate contamination within plasma chambers. One such patent focuses on a radio frequency induction plasma processing system that ensures uniform processing of workpieces.

Career Highlights:

Charles R Guarnieri is a key figure at the renowned International Business Machines Corporation (IBM). At IBM, he has been instrumental in driving innovation in plasma processing technology and contamination control. His work has not only enhanced the efficiency of processing apparatus but has also set new standards for cleanliness and reliability in industrial manufacturing processes.

Collaborations:

Throughout his career, Guarnieri has collaborated with esteemed colleagues such as Jerome J. Cuomo and Stanley Joseph Whitehair. Together, they have pushed the boundaries of plasma chamber technology, resulting in groundbreaking advancements in contamination control and processing efficiency.

Conclusion:

In conclusion, Charles R Guarnieri's inventive spirit and dedication to advancing plasma chamber technology have cemented his reputation as a trailblazer in the field of contamination control. His patents stand as a testament to his innovative approach to problem-solving and his commitment to driving progress in industrial processes.

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