The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 1994
Filed:
Jan. 30, 1992
Applicant:
Inventors:
Jerome J Cuomo, Lincolndale, NY (US);
Charles R Guarnieri, Somers, NY (US);
Jeffrey A Hopwood, Brewster, NY (US);
Stanley J Whitehair, Peekskill, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ;
U.S. Cl.
CPC ...
21912152 ; 21912143 ; 21912141 ; 20429831 ; 156345 ; 156646 ;
Abstract
A plasma processing apparatus comprising: a chamber for supporting a workpiece; an inlet for introducing a gas into the chamber; a coil of conductive material having a generally flattened configuration whereby to provide a at least one generally planar surface defined by parallel conductors disposed on the chamber; and apparatus for applying radio frequency energy to the coil.
Quick Actions:
Cuomo, Jerome. (1994). Radio frequency induction plasma processing system utilizing a uniform (U.S. Patent No. 5280154). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5280154
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile