The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 1994
Filed:
Apr. 25, 1990
Jerome J Cuomo, Lincolndale, NY (US);
Michael V Grazioso, Wappingers Falls, NY (US);
Charles R Guarnieri, Somers, NY (US);
Kurt L Haller, Peekskill, NY (US);
John E Heidenreich, III, Yorktown Heights, NY (US);
Gary S Selwyn, Hopewell Junction, NY (US);
Stanley J Whitehair, Peekskill, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A process chamber having voltage driven electrodes, e.g. plasma chamber, can be made self cleaning of particle contamination by appropriate design of the workpiece or electrode surface to provide protuberances, grooves or tapers thereon which result in a predetermined pattern in the electrostatic potential within the process chamber which can trap particulate contamination in preselected regions within the plasma chamber. These particles can then be channeled out of the process chamber through a pump port.