Peekskill, NY, United States of America

Kurt L Haller


Average Co-Inventor Count = 5.9

ph-index = 4

Forward Citations = 80(Granted Patents)


Location History:

  • Colchester, VT (US) (1993)
  • Peekskill, NY (US) (1994 - 1995)

Company Filing History:


Years Active: 1993-1995

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: The Innovations of Kurt L. Haller

Introduction

Kurt L. Haller, an accomplished inventor based in Peekskill, NY, has made significant contributions to the field of plasma processing. With a remarkable portfolio consisting of four patents, Haller has focused his innovative efforts on methods to enhance contamination control, a critical aspect in semiconductor manufacturing.

Latest Patents

One of Haller's latest patents addresses the crucial issue of contamination levels during plasma processing. His invention outlines methods and apparatus that effectively reduce particle formation in plasma processes. Key techniques include periodically pulsing the plasma energy source and applying various forms of mechanical agitation, such as shockwaves and thermal stress. These methods aim to minimize the introduction of external particles and handle those that may form spontaneously. The procedure involves pumping out the tool, cleaning surfaces, and utilizing a burst of filtered air or nitrogen for debris removal. This innovative approach not only ensures a clean working environment but also enhances semiconductor process yields by incorporating chemical precursors designed to combat particulate contamination.

Career Highlights

Haller's innovative journey has led him to work with the renowned International Business Machines Corporation (IBM), where he has collaborated on advanced technologies pivotal for the future of electronics and manufacturing. His background in plasma processing technology positions him as a leading figure in the industry.

Collaborations

Throughout his career, Haller has partnered with prominent coworkers, including Gary S. Selwyn and Reid S. Bennett. Together, they have contributed to the advancement of contamination control techniques in plasma processing, reinforcing the significance of collaborative efforts in driving innovation.

Conclusion

In summary, Kurt L. Haller's contributions to plasma processing and contamination control reflect his dedication to innovation and excellence. His patents demonstrate a deep understanding of the challenges faced in semiconductor manufacturing and provide practical solutions to enhance processes. As he continues his work at IBM, Haller remains a key player in shaping the future of technology.

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