This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 1977.
Company Filing History:
Years Active: 1977
Title: Innovations of Charles H Steele
Introduction
Charles H Steele is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of semiconductor technology, particularly in the area of polycrystalline silicon patterns. His innovative approach has led to advancements that enhance production processing in the industry.
Latest Patents
One of his key patents is titled "Process for defining polycrystalline silicon patterns." This patent describes a method for accurately defining polycrystalline silicon patterns from a masking member. The critical dimensions of the silicon patterns are controlled by a diffusion step. Self-limiting etching is achieved through the use of an etchant that discriminates between doped and undoped polycrystalline silicon. This process provides significant advantages in production processing, allowing for the fabrication of narrower gates and smoother edges on elongated silicon strips.
Career Highlights
Charles H Steele is associated with Intel Corporation, a leading company in the semiconductor industry. His work at Intel has been instrumental in pushing the boundaries of technology and innovation.
Collaborations
He has collaborated with notable colleagues, including Richard D Pashley and William H Owen, III. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a culture of innovation within the industry.
Conclusion
Charles H Steele's contributions to the field of semiconductor technology through his innovative patent and work at Intel Corporation highlight his importance as an inventor. His advancements in defining polycrystalline silicon patterns have paved the way for improved production processes in the industry.