Nanchang, China

Chaozhe Hu

This inventor holds 1 USPTO granted patent. Top assignee: Nanchang University. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chaozhe Hu. Retrieved from https://idiyas.com/inventor/chaozhe-hu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 22.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Chaozhe Hu: Innovator in Plasma Measurement Technology

Introduction

Chaozhe Hu is a notable inventor based in Nanchang, China. He has made significant contributions to the field of plasma measurement technology. His innovative approach has led to the development of a unique method for measuring the ion nonextensive parameter of plasma.

Latest Patents

Chaozhe Hu holds a patent for a method titled "Method for measuring plasma ion nonextensive parameter." This invention addresses the challenges in diagnosing the ion nonextensive parameter in plasma, which has been a gap in the field. The method utilizes nonextensive statistical mechanics to describe plasma behavior and involves a series of steps to collect and analyze measurement data effectively.

Career Highlights

Chaozhe Hu is affiliated with Nanchang University, where he continues to advance research in plasma physics. His work has garnered attention for its innovative approach and practical applications in the field. With a focus on enhancing measurement techniques, he has contributed to the understanding of plasma dynamics.

Collaborations

Chaozhe Hu has collaborated with colleagues such as Huibin Qiu and Zuozhi Hu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in research.

Conclusion

Chaozhe Hu's contributions to plasma measurement technology exemplify the impact of innovative thinking in scientific research. His patent not only fills a critical gap in the field but also paves the way for future advancements in plasma diagnostics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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