Chao-Shiuan Liu

Title: Innovations of Chao-Shiuan Liu in Organometallic Complexes

Introduction

Chao-Shiuan Liu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of organometallic chemistry, particularly in the development of noble metal complexes. With a total of 3 patents, his work has implications for various applications, including chemical vapor deposition.

Latest Patents

One of Liu's latest patents involves the creation of volatile noble metal organometallic complexes. These complexes are characterized by the general formula (I): MLX(FBC), where M represents a noble metal such as iridium, ruthenium, or osmium. The ligand L is a neutral ligand, while X is an anionic ligand. The fluorinated bidentate chelate ligand, FBC, enhances the volatility and thermal stability of the resulting complexes, making them suitable for chemical vapor deposition (CVD) applications. Additionally, Liu has developed self-reducible copper(II) source reagents for the CVD of copper metal.

Career Highlights

Chao-Shiuan Liu has worked with various institutions, including the National Research Council of Canada. His innovative research has led to advancements in the field of organometallic chemistry, particularly in the development of materials for electronic applications.

Collaborations

Liu has collaborated with notable individuals such as Yun Chi and Arthur Carty. These partnerships have contributed to the success of his research and the development of his patents.

Conclusion

Chao-Shiuan Liu's contributions to the field of organometallic chemistry are noteworthy. His innovative patents and collaborations highlight his role as a significant inventor in this domain. His work continues to influence advancements in chemical vapor deposition technologies.