Taipei, Taiwan

Chao-Lun Liu

This inventor holds 1 USPTO granted patent. Top assignee: Chenming Mold Ind. Corp.. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chao-Lun Liu. Retrieved from https://idiyas.com/inventor/chao-lun-liu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Chao-Lun Liu: Innovator in Composite Insulating Layers

Introduction

Chao-Lun Liu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of composite insulating layers. His innovative work aims to enhance the stability and performance of electronic components.

Latest Patents

Chao-Lun Liu holds a patent for a "Composite insulating layer and manufacturing method thereof." This invention includes a socket substrate, a connection layer, a conductive metal layer, an insulating metal layer, an insulating ceramic layer, and an electrodeposition layer. The composite insulating layer is designed to prevent electromagnetic interference generated from the pins of the CPU, thereby increasing the stability of the CPU.

Career Highlights

Chao-Lun Liu is currently employed at Chenming Mold Industries Corporation, where he continues to work on innovative solutions in the field of electronics. His expertise in composite materials has positioned him as a valuable asset to his company and the industry.

Collaborations

Chao-Lun Liu collaborates with talented coworkers, including Chuan-Li Cheng and Chih-Feng Hsu. Their combined efforts contribute to the advancement of technology in their field.

Conclusion

Chao-Lun Liu's work in developing composite insulating layers showcases his commitment to innovation and excellence in materials science. His contributions are vital for enhancing the performance of electronic devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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