Hsinchu, Taiwan

Chao-Hui Yeh

This inventor holds 2 USPTO granted patents and 4 published patent applications. Top assignees: Best Champion Technology Co., Ltd., G-Force Nanotech Ltd.. Active years: 2017-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chao-Hui Yeh. Retrieved from https://idiyas.com/inventor/chao-hui-yeh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2019

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2 patents (USPTO):Explore Patents

Title: Chao-Hui Yeh: Innovator in Semiconductor Technology

Introduction

Chao-Hui Yeh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods for enhancing the performance of two-dimensional layered semiconductors. With a total of 2 patents, his work is recognized for its innovative approaches to manufacturing and material science.

Latest Patents

Chao-Hui Yeh's latest patents include a "Manufacturing system and method for forming a clean interface between a functional layer and a two-dimensional layered semiconductor." This patent describes a method where a substrate with a 2D layered semiconductor is exposed to a reaction gas. A stimulus is applied to generate active particles that selectively target contaminants on the semiconductor's surface, allowing for their decomposition and removal without damaging the semiconductor itself. This process results in a clean interface that enhances the electrical properties of the 2D layered semiconductor.

Another notable patent is the "Method of fabricating two-dimensional layered chalcogenide film." This invention outlines a method and apparatus for creating a uniform two-dimensional layered chalcogenide film. By ionizing a catalyst gas, a metal-based precursor gas, and a chalcogen-based precursor gas with external stimuli, energetic particles are generated. These particles facilitate a chalcogen-substitution reaction, leading to the formation of a single crystalline layer via chemical vapor deposition.

Career Highlights

Chao-Hui Yeh has worked with several companies, including G-Force Nanotech Ltd. and Best Champion Technology Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and innovation.

Collaborations

Chao-Hui Yeh has collaborated with notable colleagues, including Chiu-Chuan Liao and Jen-Kuan Chiu. These partnerships have likely fostered a collaborative environment that enhances the development of innovative technologies in the semiconductor field.

Conclusion

Chao-Hui Yeh's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His innovative methods for improving the performance of two-dimensional layered semiconductors are paving the way for advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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