Chao-Hong Chen

Title: Chao-Hong Chen: Innovator in Semiconductor Technology

Introduction

Chao-Hong Chen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.

Latest Patents

Chao-Hong Chen holds a patent for a "Semiconductor device with backside power rail and method for forming the same." This patent describes a method of manufacturing a semiconductor device that includes forming a fin structure over a substrate, creating a sacrificial gate structure, and etching a source/drain (S/D) region of the fin structure to form an S/D recess. The fin structure consists of first and second semiconductor layers that are alternately stacked. The method also involves depositing an insulating dielectric layer in the S/D recess, applying an etch protection layer, and partially removing the insulating dielectric layer. Finally, it includes growing an epitaxial S/D feature in the S/D recess, with the insulating dielectric layer interposing the epitaxial S/D feature and the substrate.

Career Highlights

Chao-Hong Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on advancing semiconductor manufacturing techniques and enhancing device performance.

Collaborations

Chao-Hong Chen has collaborated with notable colleagues, including Hung-Chung Chien and Ming-Feng Shieh. Their combined expertise contributes to the innovative projects at their company.

Conclusion

Chao-Hong Chen's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor devices.