Chanhee Nam

Title: Chanhee Nam and His Multilayer Capacitor Patent.

Introduction

Chanhee Nam is an inventor associated with Samsung Electro-Mechanics in Suwon, South Korea. His patent work includes a multilayer capacitor design focused on the structure and composition of dielectric grains.

Latest Patents

The provided information lists one patent for Chanhee Nam: “Multilayer Capacitor Having a Dielectric Layer with Core-Shell Structured Dielectric Grains.” The invention describes a capacitor body containing dielectric layers and internal electrodes, with external electrodes on the body’s exterior. The dielectric layers contain grains made from major and minor components. At least one grain has a core, a shell, and a core-shell wall between them, while grain boundaries separate neighboring grains. The patent specifies that the ratio between the average minor-component concentration in the grain boundary and that in the core-shell wall falls between 0.40 and 0.75. This design defines a particular material structure for the capacitor’s dielectric layer.

Career Highlights

Nam’s listed patent activity concerns multilayer capacitor technology, an area relevant to the design and manufacture of electronic components. The supplied information identifies Samsung Electro-Mechanics as his company and reports 1 patent.

Collaborations

The provided information names Kimyoung Yun and Heesun Chun as Nam’s coworkers. It does not specify their roles in the patent or describe particular collaborations.

Conclusion

Chanhee Nam’s listed invention addresses the composition and microstructure of dielectric grains in a multilayer capacitor, reflecting his documented patent work associated with Samsung Electro-Mechanics.