Irvine, CA, United States of America

Changyok Park

USPTO Granted Patents = 5 

 

Average Co-Inventor Count = 2.9

ph-index = 3

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 2015-2019

where 'Filed Patents' based on already Granted Patents

5 patents (USPTO):

Title: Changyok Park: Innovator in Semiconductor Technology

Introduction

Changyok Park is a prominent inventor based in Irvine, California. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on advanced transistor and capacitor structures, which are crucial for modern electronic devices.

Latest Patents

One of Changyok Park's latest patents is the fin-shaped field effect transistor and capacitor structures. This innovative device includes a semiconductor substrate with a top and bottom surface. The design features a fin structure on the top surface, which consists of a first sidewall and a second sidewall. The first sidewall is adjacent to a first region of the substrate, while the second sidewall is adjacent to a second region. Additionally, the device incorporates an insulation layer above the fin structure and the substrate regions, along with a conductor structure positioned above and adjacent to the insulation layer.

Career Highlights

Throughout his career, Changyok Park has worked with notable companies in the technology sector. He has been associated with Broadcom Corporation and Avago Technologies General IP (Singapore) Pte. Ltd. His experience in these organizations has allowed him to develop and refine his expertise in semiconductor innovations.

Collaborations

Changyok Park has collaborated with several talented individuals in his field, including Shom Ponoth and Akira Ito. These collaborations have contributed to the advancement of technology and the successful development of innovative solutions.

Conclusion

Changyok Park is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the industry. His patents and collaborations reflect his commitment to innovation and excellence in his field.

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