CA

Changwoo Sun

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Changwoo Sun. Retrieved from https://idiyas.com/inventor/changwoo-sun-6mzbi533

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovator Changwoo Sun: Pioneering 3D NAND Technology

Introduction: Changwoo Sun is a notable inventor based in California, recognized for his contributions to the field of memory technology. He has made significant strides in the development of three-dimensional (3D) NAND memory structures, which are crucial for modern data storage solutions. His innovative approach has led to the filing of a patent that enhances the efficiency and performance of NAND memory devices.

Latest Patents: Changwoo Sun holds a patent titled "Wordline sidewall contacts in 3D NAND structures." This patent describes a three-dimensional NAND memory structure that includes material layers arranged in a vertical stack. These layers consist of alternating horizontal insulating layers and wordline layers. The design allows for the etching of material layers to form a landing pad, with a vertical wordline extending through one or more horizontal wordline layers beneath the landing pad. This configuration ensures that the vertical wordline is conductively connected to a top horizontal wordline while remaining insulated from the horizontal wordlines it extends through. Additionally, a liner may be formed over the top horizontal wordline at the landing pad.

Career Highlights: Changwoo Sun is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display technology sectors. His work at Applied Materials has positioned him at the forefront of innovation in memory technology, where he continues to develop advanced solutions for the industry.

Collaborations: Changwoo Sun collaborates with talented professionals in his field, including his coworker Hsiang Yu Lee. Together, they contribute to the advancement of technology and the development of cutting-edge memory solutions.

Conclusion: Changwoo Sun's innovative work in 3D NAND technology exemplifies the impact of dedicated inventors in the tech industry. His patent and contributions to Applied Materials, Inc. highlight the importance of continuous innovation in memory technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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