Portland, OR, United States of America

Changmin Park

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Changmin Park. Retrieved from https://idiyas.com/inventor/changmin-park-xpq3yb1t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Innovations of Changmin Park in Semiconductor Technology

Introduction

Changmin Park is an accomplished inventor based in Portland, OR (US). He has made significant contributions to the field of semiconductor technology. His innovative techniques have the potential to enhance the performance and efficiency of semiconductor devices.

Latest Patents

Changmin Park holds 1 patent for his invention titled "Laminating magnetic materials in a semiconductor device." This technique involves forming overlaying magnetic metal layers over a semiconductor substrate. Additionally, it includes the formation of at least one resistance layer between the magnetic metal layers, which is crucial for improving device functionality.

Career Highlights

Changmin Park is currently employed at Intel Corporation, a leading company in semiconductor manufacturing. His work at Intel has allowed him to explore and develop cutting-edge technologies that push the boundaries of what is possible in the industry.

Collaborations

Throughout his career, Changmin has collaborated with notable colleagues, including Ebrahim Andideh and Patrick R. Morrow. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Changmin Park's contributions to semiconductor technology exemplify the spirit of innovation. His patent on laminating magnetic materials showcases his expertise and commitment to advancing the field. His work at Intel Corporation and collaborations with esteemed colleagues further highlight his impact on the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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