Changle Guan

Title: Changle Guan: Innovator in Plasma Processing Technology

Introduction

Changle Guan is a notable inventor based in Beijing, China. He has made significant contributions to the field of plasma processing technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and functionality of plasma processing apparatuses.

Latest Patents

Guan's latest patents include a "Pressure control system for a multi-head processing chamber of a plasma processing apparatus." This innovative system features a member that is rotatable relative to a pumping port, along with multiple pressure sensors that monitor gas flow pressure. Another significant patent is the "Lift pin assembly for a plasma processing apparatus," which includes a pin housing and a height adjustment member that allows for precise control of the lift pin's position in relation to an electrostatic chuck.

Career Highlights

Throughout his career, Changle Guan has worked with prominent companies such as Beijing E-town Semiconductor Technology Co., Ltd and Mattson Technology, Inc. His experience in these organizations has allowed him to develop and refine his inventions in plasma processing technology.

Collaborations

Guan has collaborated with several professionals in his field, including Maolin Long and Xingcun Li, who have contributed to his innovative projects.

Conclusion

Changle Guan's contributions to plasma processing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in this critical area of technology.