This inventor holds 4 USPTO granted patents and 10 published patent applications. Top assignees: Beijing E-Town Semiconductor Technology, Co., Ltd, Mattson Technology, Inc, Beijing Naura Microelectronics Equipment Co., Ltd.. Active years: 2020-2026.
Company Filing History:
3 out of 116 
3 out of 285 
1 out of 118 Years Active: 2020-2026
Title: Changle Guan: Innovator in Plasma Processing Technology
Introduction
Changle Guan is a notable inventor based in Beijing, China. He has made significant contributions to the field of plasma processing technology, holding a total of 4 patents. His work focuses on enhancing the efficiency and functionality of plasma processing apparatuses.
Latest Patents
Guan's latest patents include a "Pressure control system for a multi-head processing chamber of a plasma processing apparatus." This innovative system features a member that is rotatable relative to a pumping port, along with multiple pressure sensors that monitor gas flow pressure. Another significant patent is the "Lift pin assembly for a plasma processing apparatus," which includes a pin housing and a height adjustment member that allows for precise control of the lift pin's position in relation to an electrostatic chuck.
Career Highlights
Throughout his career, Changle Guan has worked with prominent companies such as Beijing E-town Semiconductor Technology Co., Ltd and Mattson Technology, Inc. His experience in these organizations has allowed him to develop and refine his inventions in plasma processing technology.
Collaborations
Guan has collaborated with several professionals in his field, including Maolin Long and Xingcun Li, who have contributed to his innovative projects.
Conclusion
Changle Guan's contributions to plasma processing technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in this critical area of technology.