Company Filing History:
Years Active: 2022
Title: Innovator Changhee Lee: Pioneering RF Technology in Daejon
Introduction: Changhee Lee, an esteemed inventor based in Daejon, South Korea, has made significant contributions to the field of radio frequency (RF) technology. His innovative approach to frequency tuning in pulsed variable frequency RF generators has led to the granting of a patent, further solidifying his position in the technological landscape.
Latest Patents: Changhee Lee holds one patent titled "Control method of driving frequency of pulsed variable frequency RF generator." This invention presents a frequency tuning impedance matching method that analyzes a starting driving frequency set by a user, along with an RF output signal to adjust the driving frequency. The method utilizes susceptance, the imaginary component of measured admittance during the n-th pulse, to predict the next frequency. This approach allows for rapid impedance matching and facilitates reaching optimal frequencies at high speed.
Career Highlights: As a prominent member of MKS Korea Ltd., Changhee Lee has dedicated his career to advancing RF technology. His expertise in the nuances of frequency tuning has positioned him as a leading innovator within the company. Lee's commitment to continuous improvement and innovation is evident in his work, which not only meets industry standards but also sets new benchmarks for efficiency and performance.
Collaborations: Throughout his career, Changhee Lee has collaborated with talented colleagues, including Hanam Kim and Jongmin Kim. Their collective efforts have fostered an environment of creativity and innovation at MKS Korea Ltd., leading to breakthroughs in RF technology that benefit a wide array of applications.
Conclusion: With a focused vision and a dedication to his craft, Changhee Lee stands out as a pivotal figure in the realm of RF technology. His patent on the control method of driving frequency illustrates his innovative spirit and commitment to advancing the field. As he continues to work alongside skilled colleagues, the potential for future inventions and improvements in RF technology remains promising.
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