Changfeng Li

Title: Changfeng Li: Innovations in Pattern Identification and Biometric Technology

Introduction:

Changfeng Li, a prolific inventor hailing from Beijing, China, has made significant contributions to the field of pattern identification and biometric technology. With an impressive portfolio of 234 patents, Li has played a crucial role in advancing the accuracy and functionality of devices used for pattern identification, particularly in the areas of fingerprints and other biometric features. This article explores Li's latest patents, career highlights, notable collaborations, and the impact of his innovations in the field.

Latest Patents:

Among Changfeng Li's recent patents, there are two notable inventions that have garnered attention in the tech and security industries:

1. Pattern Identification Device and Display Apparatus:

This patent involves a device capable of identifying patterns on a surface, utilizing a photosensitive layer and a light-guiding layer. The device's photosensitive elements convert incident light into electrical signals, while the light-guiding units guide reflected light from a pattern feature to the corresponding photosensitive element. This design enables accurate and efficient identification of various patterns, including fingerprints or other biometric and non-biometric features. The device boasts a reduced thickness, enhanced accuracy, and broad applications.

2. Biometric Sensor, Display Apparatus, and Method for Detecting Biometric Information:

This patent introduces a biometric sensor equipped with a touch detection layer and a light emitting layer. The sensor employs a photo-sensing layer to detect light completely reflected when in contact with a user's skin. The touch sensing circuit determines touch positions, enabling the processor to control the light emitting layer and form a scanning light source. The biometric information analysis circuit then assesses the light intensity distribution to determine the user's biometric information. This innovation offers advanced biometric detection capabilities with substantial accuracy.

Career Highlights:

Throughout his career, Changfeng Li has showcased his expertise and passion for developing cutting-edge technology in renowned companies such as Boe Technology Group Co., Ltd., and Beijing Boe Optoelectronics Technology Co., Ltd. His exceptional skills in invention and design have undoubtedly contributed to these companies' success.

Collaborations:

Li has collaborated with several notable individuals on his patented inventions, including Haisheng Wang and Yingming Liu. Together, they have brought their collective expertise to the forefront of pattern identification and biometric technology.

Conclusion:

Changfeng Li's impressive portfolio of patents stands as a testament to his inventive prowess in pattern identification and biometric technology. Through his contributions, Li has paved the way for advancements in the accuracy and usability of devices utilized in various applications, including fingerprint identification and other biometric features. Li's collaborations with esteemed colleagues have furthered the productivity and success of his inventions. As the field of technology continues to evolve, Changfeng Li will undoubtedly remain at the forefront, driving innovation and pushing the boundaries of what is possible in the realm of pattern identification and biometric technology.