Seoul, South Korea

Chang-Yeon Yoo

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang-Yeon Yoo. Retrieved from https://idiyas.com/inventor/chang-yeon-yoo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 9.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Chang-Yeon Yoo: Innovator in Semiconductor Technology

Introduction

Chang-Yeon Yoo is a prominent inventor based in Seoul, South Korea. He is known for his contributions to the field of semiconductor technology. With a focus on innovative manufacturing methods, Yoo has made significant strides in enhancing semiconductor devices.

Latest Patents

Chang-Yeon Yoo holds a patent for a semiconductor device and the method of manufacturing the same. This patent involves the formation of a punch-through prevention film pattern and a channel film pattern on an insulation layer. The punch-through prevention pattern and the insulation layer may include nitride and oxide, respectively. Notably, the punch-through prevention pattern is strategically located under the channel pattern. This innovation is crucial for improving the efficiency and reliability of semiconductor devices.

Career Highlights

Yoo is currently employed at Samsung Electronics Co., Ltd., a leading global technology company. His work at Samsung has allowed him to collaborate with some of the brightest minds in the industry. His contributions have been instrumental in advancing semiconductor technology.

Collaborations

Some of his notable coworkers include Jin-Hong Kim and Jong-Seon Ahn. Their collaborative efforts have further enhanced the innovative capabilities within their projects.

Conclusion

Chang-Yeon Yoo is a key figure in the semiconductor industry, with a focus on innovative manufacturing techniques. His patent and work at Samsung Electronics Co., Ltd. highlight his commitment to advancing technology. His contributions will continue to influence the future of semiconductor devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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