Company Filing History:
Years Active: 2017-2019
Title: Innovations by Chang-Woo Sohn
Introduction
Chang-Woo Sohn is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.
Latest Patents
Chang-Woo Sohn's latest patents include innovative designs for semiconductor devices. One notable patent describes semiconductor devices that incorporate contact structures which partially overlap silicide layers. This design features a substrate with an isolation layer that defines active portions, along with an epitaxial layer and a metal silicide layer. The contact structure is specifically designed to only partially overlap the metal silicide layer, providing improved functionality. Another patent details semiconductor devices that include active fins and methods for their manufacturing. This design features a plurality of active fins extending in a specific direction on a substrate, along with a gate structure and a source/drain layer that has a unique curved portion.
Career Highlights
Chang-Woo Sohn is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the industry.
Collaborations
Throughout his career, Chang-Woo Sohn has collaborated with notable colleagues, including Shigenobu Maeda and Young-Moon Choi. These collaborations have fostered innovation and have been instrumental in the development of new semiconductor technologies.
Conclusion
Chang-Woo Sohn's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor devices, showcasing the importance of innovation in technology.