Chang Weon Lee

Title: Chang Weon Lee: Innovator in Substrate Treatment Technologies

Introduction

Chang Weon Lee is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate treatment technologies, holding a total of 2 patents. His work focuses on improving processes and apparatuses that enhance the efficiency and effectiveness of substrate treatment.

Latest Patents

Chang Weon Lee's latest patents include a "Substrate Treating Apparatus and Method" and an "Apparatus and Method for Treating Substrate." The substrate treating apparatus features a processing chamber, a substrate supporting unit, a plasma generation unit, a gas supplying unit, and an exhaust adjusting unit. This innovative design allows for the adjustment of discharge amounts of residual gas and reaction by-products, thereby controlling the uniformity of the substrate treating process. The second patent outlines a substrate treatment apparatus that includes a load port for accommodating multiple substrates, a plasma treatment unit for surface treatment, and a substrate transfer unit for efficient handling.

Career Highlights

Chang Weon Lee is currently employed at Psk Inc., where he continues to develop cutting-edge technologies in substrate treatment. His expertise in this area has positioned him as a key player in the industry, contributing to advancements that benefit various applications.

Collaborations

Throughout his career, Chang has collaborated with notable colleagues, including Jongjin Lee and Bum Joon Park. These partnerships have fostered innovation and have led to the development of new technologies in substrate processing.

Conclusion

Chang Weon Lee's contributions to substrate treatment technologies demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of the complexities involved in substrate processing, making him a valuable asset to the industry.