The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Jan. 02, 2014
Applicant:
Psk Inc., Gyeonggi-do, KR;
Inventors:
Jongjin Lee, Gyeonggi-do, KR;
Bum Joon Park, Gyeonggi-do, KR;
Tae Hoon Kim, Gyeonggi-do, KR;
Chang Weon Lee, Gyeonggi-do, KR;
Sunwoong Yim, Gyeonggi-do, KR;
Han Kyu Lee, Gyeonggi-do, KR;
Assignee:
PSK INC., Gyeonggi-do, KR;
Primary Examiner:
Int. Cl.
CPC ...
B08B 6/00 (2006.01); H01L 21/02 (2006.01); H01J 37/32 (2006.01); H01L 21/673 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02046 (2013.01); H01J 37/32192 (2013.01); H01J 37/32779 (2013.01); H01L 21/02076 (2013.01); H01L 21/67383 (2013.01); H01L 21/67766 (2013.01); H01L 21/6835 (2013.01); H01L 21/6836 (2013.01); H01L 21/68707 (2013.01); H01L 2221/6834 (2013.01); H01L 2221/68327 (2013.01);
Abstract
Provided is a substrate treatment apparatus. The substrate treatment apparatus includes a load port on which a carrier accommodating a plurality of substrates to which a back-ground wafer is attached to a mounting tape fixed to a frame ring is placed, a plasma treatment unit supplying plasma to treat a top surface of the wafer, and a substrate transfer unit transferring the substrate between the carrier and the plasma treatment unit.