This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2006.
Company Filing History:
Years Active: 2006
Title: Chang Wen - Innovator in Semiconductor Technology
Introduction
Chang Wen is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in methods that enhance the manufacturing processes of integrated circuits. His innovative approaches have led to advancements that benefit the industry as a whole.
Latest Patents
Chang Wen holds a patent for a "Shallow trench isolation method for reducing oxide thickness variations at different pattern densities." This method addresses the challenges of oxide thickness variations in shallow trench isolation (STI) patterns. The process involves a first high-density plasma chemical vapor deposition (HDP CVD) step, which utilizes a deposition/sputter (D/S) ratio of 9.5 to create a dielectric layer. This layer is designed to be 120 to 130% of the shallow trench depth. An etch back is then performed in the same CVD chamber using NF3 and SiF4 to remove approximately 40 to 50% of the initial dielectric layer. A second HDP CVD step with a D/S ratio of 16 deposits an additional layer of dielectric material, resulting in a smoother surface that facilitates subsequent planarization steps. This innovative method minimizes dishing in wide trenches, enhancing the overall performance of STI features.
Career Highlights
Chang Wen is associated with Taiwan Semiconductor Manufacturing Company Ltd., a leading player in the semiconductor industry. His work has been instrumental in developing techniques that improve the efficiency and reliability of semiconductor devices. With a focus on innovation, he continues to push the boundaries of technology in his field.
Collaborations
Chang Wen has collaborated with notable colleagues, including Chih-Cheng Lu and Chuan-Ping Hou. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in semiconductor technology.
Conclusion
Chang Wen's contributions to semiconductor technology through his innovative patent demonstrate his commitment to enhancing manufacturing processes. His work not only benefits his company but also the broader industry, showcasing the importance of innovation in technology.