Cheonan-si, South Korea

Chang Suk Oh

USPTO Granted Patents = 3 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2023-2024

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3 patents (USPTO):Explore Patents

Title: Chang Suk Oh: Innovator in Substrate Treatment Technology

Introduction

Chang Suk Oh is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of substrate treatment technology, holding a total of 3 patents. His innovative designs focus on improving the efficiency and effectiveness of substrate treatment processes.

Latest Patents

Chang Suk Oh's latest patents include a "Nozzle standby port, apparatus for treating substrate including the same and method for cleaning nozzle using the same." This invention provides an apparatus for treating a substrate, featuring a cup with an open upper portion, a support unit for the substrate, and a liquid supply unit with a treating liquid supply nozzle. The nozzle standby port is designed to provide a standby space for the nozzle before and after treatment, including a cleaning member for maintaining the nozzle's cleanliness. Another patent is the "Cleaning jig, substrate treating apparatus including the same, cleaning method of substrate treating apparatus." This concept involves a substrate treating apparatus with a rotatable spin head and a cleaning jig that discharges cleaning liquid through centrifugal force, enhancing the cleaning process.

Career Highlights

Chang Suk Oh is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions in substrate treatment technology. His work has been instrumental in advancing the capabilities of substrate treatment systems, making them more efficient and effective.

Collaborations

Some of his coworkers include Sang Eun Noh and Kisang Eum, who collaborate with him on various projects within the company.

Conclusion

Chang Suk Oh's contributions to substrate treatment technology through his patents and work at Semes Co., Ltd. highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of substrate treatment processes.

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