logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11845090 B1

PDFFull Text
Date of Patent:
Dec. 19, 2023

Filed:

Jul. 01, 2020

Nozzle apparatus, apparatus and method for treating substrate

Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Chang Suk Oh, Cheonan-si, KR;

Woo Sin Jung, Yeoju-si, KR;

UnKyu Kang, Cheonan-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:

Harness, Dickey & Pierce, P.L.C.

Primary Examiner:

Levon J Shahinian

Int. Cl.
CPC ...
B05B 1/16 (2006.01); B05B 7/06 (2006.01); B05B 12/00 (2018.01); B05B 12/04 (2006.01); B05B 14/00 (2018.01); B05B 15/555 (2018.01); B05B 16/20 (2018.01); B08B 3/02 (2006.01); G03F 7/16 (2006.01); G03F 7/30 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
B05B 1/16 (2013.01); B05B 7/061 (2013.01); B05B 7/062 (2013.01); B05B 12/00 (2013.01); B05B 12/04 (2013.01); B05B 14/00 (2018.02); B05B 15/555 (2018.02); B05B 16/20 (2018.02); B08B 3/02 (2013.01); G03F 7/162 (2013.01); G03F 7/3021 (2013.01); H01L 21/02052 (2013.01); H01L 21/02057 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 21/67178 (2013.01); H01L 21/67259 (2013.01); H01L 21/68764 (2013.01); Y02P 70/10 (2015.11);
Abstract

An apparatus for performing liquid treatment for a substrate is provided. The apparatus for performing the liquid treatment for the substrate may include a housing having a treatment space, a substrate support unit to support and rotate the substrate in the treatment space, a liquid feeding unit including a nozzle device including a central exhaust port and multiple first outer exhaust ports, which are provided in a shape of a ring to form a concentric circle with the central exhaust port to feed mutually different treating liquids onto the substrate through respective exhaust ports, and a controller to control the liquid feeding unit.

Find Patent Forward Citations

Oh, Chang. (2023). Nozzle apparatus, apparatus and method for treating substrate (U.S. Patent No. 11845090). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11845090

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…