Chiba, Japan

Chang-Lian Yan

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chang-Lian Yan. Retrieved from https://idiyas.com/inventor/chang-lian-yan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 10.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovative Work of Chang-Lian Yan in Silicon Film Technology

Introduction

Chang-Lian Yan is an accomplished inventor based in Chiba-ken, Japan. With a dedicated focus on advancing semiconductor manufacturing processes, his contributions have made significant impacts in the field of silicon film technology. His innovative methods and research reflect the importance of continuous development in the microelectronics industry.

Latest Patents

Chang-Lian Yan holds a patent for his invention titled "Methods for forming silicon comprising films using hexachlorodisilane in a single-wafer deposition chamber." This patent describes a method for fabricating a silicon comprising film, which is essential in the production of various electronic devices. The process involves growing the silicon comprising film on a substrate using hexachlorodisilane (HCD) as one of the reactant species. Notably, the film is formed under a pressure ranging between 10 Torr and 350 Torr, showcasing a novel approach to enhance the quality and efficiency of silicon films.

Career Highlights

Yan is a valued member of Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials underscores his commitment to developing cutting-edge technologies that support the ever-evolving landscape of electronic manufacturing.

Collaborations

Throughout his career, Chang-Lian Yan has collaborated with other esteemed professionals in the field, including his coworkers Lee Luo and R. Suryanarayanan Iyer. These collaborations reflect the interconnected nature of advances in technology, as teamwork often leads to groundbreaking innovations.

Conclusion

Chang-Lian Yan's contributions to silicon film technology demonstrate the essential role of inventors in shaping the future of electronics. As the industry continues to grow, the work of innovators like Yan will be critical to overcoming challenges and fostering advancements in technology. His achievements in patenting novel methods signify a commitment to excellence and reflect the spirit of innovation in today's fast-paced technological environment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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