Chang Jen Shieh

Title: Chang Jen Shieh: Innovator in Plasma Etch Technology

Introduction

Chang Jen Shieh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of microelectronics, particularly in the area of plasma etch methods. His innovative approach has led to advancements in the fabrication of patterned layers with enhanced critical dimension control.

Latest Patents

Chang Jen Shieh holds a patent for a "Plasma etch method for forming patterned layer with enhanced critical dimension (CD) control." This patent describes a feed-forward method for creating a patterned target layer within microelectronic fabrication. The method involves establishing a correlation between the linewidth of a patterned photoresist layer and the plasma species concentration. This correlation allows for adjustments during the etching process, ensuring that the patterned target layer is formed with a linewidth that closely matches the target specifications.

Career Highlights

Chang is associated with Taiwan Semiconductor Manufacturing Company Limited, where he has been instrumental in developing cutting-edge technologies. His work has not only contributed to the company's success but has also advanced the microelectronics industry as a whole. With a focus on precision and control, Chang's innovations have set new standards in the field.

Collaborations

Throughout his career, Chang has collaborated with notable colleagues, including Chi Kang Liu and Pei Hung Chen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Chang Jen Shieh's contributions to plasma etch technology exemplify the spirit of innovation in the microelectronics industry. His patented methods and collaborative efforts continue to influence the field, paving the way for future advancements.