Chang-hyun Jeong

Title: Innovations of Chang-hyun Jeong in Substrate Etching

Introduction

Chang-hyun Jeong is a notable inventor based in Pusan, South Korea. He has made significant contributions to the field of substrate etching, particularly through his innovative methods that enhance the efficiency and precision of the process. With a total of two patents to his name, Jeong's work is recognized for its technical depth and practical applications.

Latest Patents

Chang-hyun Jeong's latest patents focus on a method of etching substrates using inductively coupled plasma reactive ion etching (ICP RIE). This method involves creating a hard photo-resist pattern or metal mask pattern that defines scribe lines on a sapphire substrate or a semiconductor epitaxial layer. The substrate is then etched along these scribe lines to form etched channels, utilizing an etching gas comprised of BCl and/or BCl/Cl gas, with the optional addition of Ar. This innovative approach allows for the production of stress lines through the substrate along the etched channels, facilitating the dicing process along these lines. Additionally, the thinning process involves subjecting the substrate surface to ICP RIE using similar etching gases, which is particularly effective for sapphire and other hard substrates.

Career Highlights

Throughout his career, Chang-hyun Jeong has worked with prominent companies such as Oriol Inc. and LG Electronics Inc. His experience in these organizations has contributed to his expertise in substrate etching technologies and has allowed him to develop his patented methods.

Collaborations

Chang-hyun Jeong has collaborated with notable colleagues in the field, including Geun-Young Yeom and Myung Cheol Yoo. These collaborations have likely enriched his research and development efforts, leading to innovative solutions in substrate processing.

Conclusion

Chang-hyun Jeong's contributions to the field of substrate etching through his patented methods demonstrate his commitment to advancing technology in this area. His work not only enhances the efficiency of substrate processing but also showcases the importance of innovation in the semiconductor industry.