Company Filing History:
Years Active: 1989-1994
Title: Chang-Hwang Hua: Innovator in Semiconductor Technology
Introduction
Chang-Hwang Hua is a prominent inventor based in Palo Alto, CA, known for his contributions to semiconductor technology. He holds a total of 5 patents, showcasing his innovative approach to solving complex engineering challenges. His work has significantly impacted the field of electronics and materials science.
Latest Patents
One of his latest patents is a method for forming a self-aligned T-shaped transistor electrode. This innovative process involves creating a T-shaped electrode on a semiconductor substrate by applying a dielectric film and utilizing multiple layers of photoresist with different optical properties. The method requires precise photolithographic techniques to selectively remove portions of the photoresist layers and dielectric film, ultimately allowing for the deposition of metal to form the T-shaped electrode.
Another notable patent is the rapid wafer thinning process, which provides a method for thinning a Gallium Arsenide (GaAs) layer on the backside of a wafer substrate. This process involves spraying an etchant solution while the wafer is rotated, achieving significant thinning in a short time frame. This innovation is crucial for enhancing the performance of semiconductor devices.
Career Highlights
Chang-Hwang Hua is currently employed at Avantek, Inc., where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise and innovative mindset have made him a valuable asset to the company and the field at large.
Collaborations
Throughout his career, Chang-Hwang has collaborated with notable colleagues, including Ding-Yuan S Day and Simon S Chan. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.
Conclusion
Chang-Hwang Hua's contributions to semiconductor technology through his patents and innovative methods have established him as a leading figure in the industry. His work continues to influence the development of advanced electronic devices and materials.