This inventor holds 1 USPTO granted patent. Top assignees: Infineon Ag, Mosel Vitelic Corporation, Promos Technologies, Inc. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 13 
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1 out of 358 
Years Active: 2000
Title: Chang Hsun Lee: Innovator in Integrated Circuit Technology
Introduction
Chang Hsun Lee is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of integrated circuit technology, particularly through his innovative methods for forming metal lines in circuits.
Latest Patents
Chang Hsun Lee holds a patent titled "Method of forming metal lines in an integrated circuit having reduced." This patent outlines a method that includes forming a composite metal layer over a wafer, which consists of a top layer of titanium/titanium nitride. The process involves oxidizing this top layer to create a layer of titanium oxide, followed by patterning and etching the composite metal layer to establish the metal lines.
Career Highlights
Throughout his career, Chang Hsun Lee has worked with prominent companies in the semiconductor industry. He has been associated with Mosel Vitelic Corporation and Infineon AG, where he contributed to advancements in integrated circuit technology.
Collaborations
Chang Hsun Lee has collaborated with several professionals in his field, including Chung-Yi Chiu and Jeng-Pei Chen. Their collective efforts have furthered the development of innovative technologies in integrated circuits.
Conclusion
Chang Hsun Lee's contributions to integrated circuit technology through his patent and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field significantly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile