Chang-Chun (Roland) Yeh

Title: Chang-Chun (Roland) Yeh: Innovator in Semiconductor Manufacturing

Introduction

Chang-Chun (Roland) Yeh is a notable inventor based in Miaoli, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of etching processes. His innovative approach has led to the development of a unique method that enhances the efficiency and accuracy of semiconductor production.

Latest Patents

Chang-Chun Yeh holds a patent for a method titled "Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing." This patent describes a technique for monitoring the etching process of via/contact holes using a test structure that includes holes of varying sizes and densities. The method utilizes a scanning electron microscope to identify etching differences, which are then processed into a "fingerprint" image. This image characterizes the etching process and helps in maintaining process uniformity, thereby preventing potential electrical defects and improving yield.

Career Highlights

Chang-Chun Yeh is currently employed at Hermes Microvision, Inc., where he applies his expertise in semiconductor technology. His work focuses on advancing the methods used in wafer manufacturing, contributing to the overall efficiency of the production process. His innovative solutions have positioned him as a key figure in the semiconductor industry.

Collaborations

Chang-Chun has collaborated with notable colleagues, including Yan Zhao and Zhongwei Chen. Their combined efforts have furthered research and development in semiconductor manufacturing techniques.

Conclusion

Chang-Chun (Roland) Yeh's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to advancing technology in this critical field. His work not only enhances production efficiency but also ensures higher quality in semiconductor products.