Suzhou, China

Chan Wu

This inventor holds 1 USPTO granted patent. Top assignee: Monolithic Power Systems, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chan Wu. Retrieved from https://idiyas.com/inventor/chan-wu-sf9w4wg6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Chan Wu in Semiconductor Processing

Introduction

Chan Wu is a notable inventor based in Suzhou, China. He has made significant contributions to the field of semiconductor processing. His innovative approach has led to the development of a unique patent that enhances the efficiency of semiconductor wafer patterning.

Latest Patents

Chan Wu holds a patent for a method titled "Laser Induced Semiconductor Wafer Patterning." This patent describes a semiconductor wafer processing method that involves ablating the back side of a semiconductor wafer using a laser ablation process. The method also includes etching the back side of the semiconductor wafer, which preserves the pattern created by the laser ablation process. This innovative technique allows for precise patterning, which is crucial in semiconductor manufacturing. Chan Wu has 1 patent to his name.

Career Highlights

Chan Wu is currently employed at Monolithic Power Systems, Inc., where he continues to work on advancements in semiconductor technology. His role at the company allows him to collaborate with other talented professionals in the field.

Collaborations

One of his notable coworkers is Sudarsan Uppili. Together, they contribute to the innovative projects at Monolithic Power Systems, Inc.

Conclusion

Chan Wu's work in semiconductor processing exemplifies the importance of innovation in technology. His patent for laser-induced wafer patterning showcases his commitment to advancing the field. His contributions are paving the way for future developments in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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