Company Filing History:
Years Active: 2025
Title: Innovations of Chan Wook Jang in Transition Metal Dichalcogenides
Introduction
Chan Wook Jang is an accomplished inventor based in Yongin-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of transition metal dichalcogenides. His innovative work has led to advancements in the fabrication of high-quality thin films, which have various applications in electronics and optoelectronics.
Latest Patents
One of Chan Wook Jang's notable patents is related to a Janus transition metal dichalcogenide thin film and the method of fabricating the same. The patent outlines a method that includes three key steps: depositing a transition metal dichalcogenide thin film on an oxide silicon substrate, forming vacancies in the thin film, and substituting chalcogen elements to create a Janus structure. This process can be performed in a single chemical vapor deposition (CVD) process within the same reaction chamber. The innovation not only shortens the processing time but also reduces manufacturing costs while minimizing damage to the thin film, resulting in high-quality single-crystal structures.
Career Highlights
Chan Wook Jang is affiliated with the University-Industry Cooperation Group of Kyung Hee University. His work in this group emphasizes collaboration between academic research and industrial applications, fostering innovation in material sciences. His expertise in transition metal dichalcogenides has positioned him as a key figure in this research area.
Collaborations
Chan Wook Jang has collaborated with notable colleagues, including Suk Ho Choi and Won Jun Lee. These collaborations have further enhanced the research output and innovation in the field of transition metal dichalcogenides.
Conclusion
Chan Wook Jang's contributions to the field of transition metal dichalcogenides through his innovative patent and collaborative efforts highlight his role as a leading inventor in materials science. His work continues to influence advancements in the fabrication of high-quality thin films, paving the way for future technological developments.