Chan-Syun Yang

Title: Innovations of Chan-Syun Yang

Introduction

Chan-Syun Yang is a notable inventor based in Beverly Hills, CA (US). He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced etching processes and materials. With a total of 2 patents, his work has had a considerable impact on the industry.

Latest Patents

One of Chan-Syun Yang's latest patents is titled "Hydrogen ashing enhanced with water vapor and diluent gas." This invention describes an oxygen-free hydrogen plasma ashing process that is particularly useful for low-k dielectric materials based on hydrogenated silicon oxycarbide materials. The main ashing step involves exposing a previously etched dielectric layer to a plasma of hydrogen, optional nitrogen, a larger amount of water vapor, and an even larger amount of argon or helium. For porous low-k dielectrics, the ashing plasma additionally contains a hydrocarbon gas such as methane. The process may also include a short surface treatment using a hydrogen-containing reducing gas.

Another significant patent is the "Method of forming a notched silicon-containing gate structure." This method is particularly useful for creating a T-shaped silicon-containing gate structure. The process involves etching a silicon-containing gate layer to a desired depth using a plasma generated from a first source gas. During this etch, byproducts deposit on the upper sidewalls of the gate layer, forming a protective passivation layer. A relatively high substrate bias power is used to ensure proper adherence of the passivation layer. The remaining portion of the gate layer is then etched at a lower bias power, allowing for precise control over the notch's height and width.

Career Highlights

Chan-Syun Yang is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work at Applied Materials has allowed him to push the boundaries of semiconductor manufacturing processes and materials.

Collaborations

Throughout his career, Chan-Syun Yang has collaborated with notable colleagues, including Changhun Lee and Meihua Shen. These collaborations have contributed to the advancement of innovative technologies in the semiconductor field.

Conclusion

Chan-Syun Yang's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a significant innovator in the industry. His inventions continue to influence the development of advanced materials and processes in semiconductor manufacturing.