Osan-si Gyeonggi-do, South Korea

Chan Soo Park

This inventor holds 1 USPTO granted patent. Top assignee: Wonik Ips Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chan Soo Park. Retrieved from https://idiyas.com/inventor/chan-soo-park-8koei8kk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Chan Soo Park

Introduction

Chan Soo Park is a notable inventor based in Osan-si, Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing technology. With a focus on enhancing the efficiency and effectiveness of substrate processing, his work has garnered attention in the industry.

Latest Patents

Chan Soo Park holds a patent for a substrate processing apparatus. This invention relates to a substrate processing apparatus designed to operate at both high and low pressures. The apparatus includes a process chamber with an inner space, an installation groove defined at the central side of the bottom surface, and a substrate support that allows for the secure seating of the substrate. The inner lid part is designed to move vertically within the inner space, creating a sealed processing space for optimal substrate processing.

Career Highlights

Chan Soo Park is currently employed at Wonik Ips Co., Ltd., where he continues to innovate in the field of substrate processing. His work has contributed to advancements in technology that are essential for various applications in the industry.

Collaborations

He has collaborated with notable coworkers, including Tae Dong Kim and Jung Hwan Lee, who have also contributed to the development of innovative technologies in their respective fields.

Conclusion

Chan Soo Park's contributions to substrate processing technology highlight his role as an influential inventor. His patent for a substrate processing apparatus demonstrates his commitment to innovation and excellence in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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