Chan-sam Chang

Title: Chan-sam Chang: Innovator in Extreme Ultraviolet Technology

Introduction

Chan-sam Chang is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor manufacturing through his innovative patents. With a total of 2 patents, his work focuses on enhancing the efficiency and accuracy of extreme ultraviolet (EUV) exposure processes.

Latest Patents

Chang's latest patents include an "Extreme Ultraviolet Exposure Apparatus and Method" and a "Method of Manufacturing Semiconductor Device by Using the Exposure Method." These inventions aim to minimize errors caused by mirrors in the EUV exposure process, thereby improving overlay accuracy. The EUV exposure apparatus features an EUV source that generates and outputs EUV, first illumination optics that transfer the EUV to an EUV mask, and projection optics that project the reflected EUV onto an exposure target. Additionally, it includes a laser source for heating and second illumination optics that irradiate the laser beam onto mirrors within the projection optics.

Career Highlights

Chan-sam Chang is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of EUV exposure systems, which are critical for the production of next-generation semiconductor devices.

Collaborations

Some of his notable coworkers include Doo-gyu Lee and Seung-yoon Lee, who have collaborated with him on various projects within the semiconductor field.

Conclusion

Chan-sam Chang's innovative contributions to extreme ultraviolet technology have positioned him as a key figure in semiconductor manufacturing. His patents reflect a commitment to improving the precision and efficiency of the industry, making a lasting impact on technology.