Chan-Min Park

Title: Innovations of Chan-Min Park

Introduction

Chan-Min Park is a notable inventor based in Pusan-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the development of phase shifting masks. With a total of 2 patents, his work has advanced the manufacturing processes in this critical area.

Latest Patents

Chan-Min Park's latest patents include a method of manufacturing a phase shifting mask and the structure of a phase shifting mask. The first patent outlines a method that involves forming a phase shifting layer on a transparent substrate, followed by the creation of an anti-deposition layer. The process includes patterning both layers, wet-etching the anti-deposition layer, and selectively forming a light shielding layer. This innovative approach enhances the reliability of the phase shifting mask. The second patent describes the structure of a phase shifting mask, which consists of a light transmitting substrate, a phase shifting layer, an adhesive layer, and a light shielding layer. This design improves the adhesive strength and overall reliability during the etching process.

Career Highlights

Chan-Min Park is currently employed at LG Semicon Co., Ltd., where he continues to push the boundaries of semiconductor technology. His expertise and innovative mindset have made him a valuable asset to the company.

Collaborations

Some of his notable coworkers include Young-Kwon Jun and Yong-Kyoo Choi, who have collaborated with him on various projects within the semiconductor field.

Conclusion

Chan-Min Park's contributions to the field of semiconductor technology through his patents and work at LG Semicon Co., Ltd. highlight his role as an influential inventor. His innovative methods and designs continue to shape the industry and improve manufacturing processes.