The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 1999
Filed:
May. 22, 1997
Applicant:
Inventors:
Chan-Min Park, Cheongju-si, KR;
Young-Kwon Jun, Seoul, KR;
Assignee:
LG Semicon Co., Ltd., Chungcheongbuk-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ;
Abstract
A method of manufacturing a phase shifting mask includes the steps of forming a phase shifting layer on a transparent substrate; forming an anti-deposition layer on the phase shifting layer; patterning the phase shifting layer and the anti-deposition layer; wet-etching the anti-deposition layer to expose a portion of the phase shifting layer; selectively forming a light shielding layer on the exposed portion of the phase shifting layer; and removing the anti-deposition layer.