Chan Lon Yang

Title: Innovations by Chan Lon Yang

Introduction

Chan Lon Yang is a notable inventor based in Los Gatos, California. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on methods that enhance the manufacturing processes of semiconductor devices.

Latest Patents

One of Chan Lon Yang's latest patents is titled "In situ hard mask approach for self-aligned contact etch." This patent describes a method that includes forming a first insulating layer over a semiconductor substrate, followed by the creation of a hard mask layer. The method also involves forming a photoresist etch mask with a thickness of less than about 4,000 angstroms. This reduced thickness can lead to uncontrolled etching, but the method ensures controllability by maintaining a hard mask in place during the etching process.

Another significant patent involves methods of forming semiconductor structures that have reduced defects. This method describes the formation of a trench in a semiconductor substrate, which includes a silicon layer, an oxide layer, and a nitride layer. The process includes etching the nitride layer to a specific endpoint using a specialized etching chemistry. This innovation aims to improve the quality and reliability of semiconductor devices.

Career Highlights

Chan Lon Yang has worked with prominent companies in the semiconductor industry, including Cypress Semiconductor Corporation and Applied Materials, Inc. His experience in these organizations has contributed to his expertise in semiconductor manufacturing processes.

Collaborations

Throughout his career, Chan has collaborated with notable colleagues, including Jeffrey S. Marks and Nicolas J. Bright. These collaborations have likely enriched his work and led to further advancements in semiconductor technology.

Conclusion

Chan Lon Yang's contributions to semiconductor technology through his innovative patents and career experiences highlight his role as a significant inventor in the field. His work continues to influence the development of advanced semiconductor devices.