Chan Hyeong Lee

Title: Innovations of Chan Hyeong Lee

Introduction

Chan Hyeong Lee is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents to his name, his work is recognized for its innovative approaches and technical advancements.

Latest Patents

One of his latest patents is a semiconductor device that includes an active pattern disposed on a substrate. This device features a gate insulating film that extends along the active pattern, along with a work function adjustment pattern that is also disposed on the gate insulating film. The gate electrode is placed on the work function adjustment pattern, which consists of a first work function adjustment film, a second work function adjustment film containing aluminum, and a barrier film made of titanium silicon nitride (TiSiN). The silicon concentration of the barrier film is maintained at about 30 at % or less.

Another patent focuses on a semiconductor device and the method for fabricating it. This device includes a substrate, a first active pattern that is spaced apart from the substrate, and a gate insulating film that surrounds the first active pattern. Additionally, it features a first work function adjustment film that includes carbon and surrounds the gate insulating film, along with a first barrier film that encloses the first work function adjustment film. Notably, the carbon concentration of the first work function adjustment film increases as it moves away from the first barrier film.

Career Highlights

Chan Hyeong Lee is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to contribute to cutting-edge technologies in semiconductor devices.

Collaborations

He has collaborated with notable coworkers, including Byoung Hoon Lee and Sung In Suh, who have also made significant contributions to their respective fields.

Conclusion

Chan Hyeong Lee's innovative work in semiconductor technology exemplifies the advancements being made in this critical area. His patents reflect a commitment to improving device functionality and efficiency.